Invention Grant
- Patent Title: Substrate features for inductive monitoring of conductive trench depth
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Application No.: US15891290Application Date: 2018-02-07
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Publication No.: US10199281B2Publication Date: 2019-02-05
- Inventor: Wei Lu , Zhihong Wang , Wen-Chiang Tu , Zhefu Wang , Hassan G. Iravani , Boguslaw A. Swedek , Fred C. Redeker , William H. McClintock
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01L21/66
- IPC: H01L21/66 ; H01L21/321

Abstract:
A substrate for use in fabrication of an integrated circuit has a layer with a plurality of conductive interconnects. The substrate includes a semiconductor body, a dielectric layer disposed over the semiconductor body, a plurality of conductive lines of a conductive material disposed in first trenches in the dielectric layer to provide the conductive interconnects, and a closed conductive loop structure of the conductive material disposed in second trenches in the dielectric layer. The closed conductive loop is not electrically connected to any of the conductive lines.
Public/Granted literature
- US20180166347A1 SUBSTRATE FEATURES FOR INDUCTIVE MONITORING OF CONDUCTIVE TRENCH DEPTH Public/Granted day:2018-06-14
Information query
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