Invention Grant
- Patent Title: Apparatuses and methods for gas mixed liquid polishing, etching, and cleaning
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Application No.: US14481725Application Date: 2014-09-09
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Publication No.: US10204804B2Publication Date: 2019-02-12
- Inventor: Johann Kosub
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; C25D3/38 ; C25D5/52 ; C23F1/18 ; H01L21/02 ; H01L21/321 ; H01L21/3213 ; H01L21/687 ; C23F1/08 ; C23F3/06 ; H01L21/768
Abstract:
In accordance with an embodiment of the present invention, a method of polishing a device includes providing a layer having a non-uniform top surface. The non-uniform top surface includes a plurality of protrusions. The method further includes removing the plurality of protrusions by exposing the layer to a fluid that has gas bubbles and a liquid.
Public/Granted literature
- US20140374023A1 Apparatuses and Methods for Gas Mixed Liquid Polishing, Etching, and Cleaning Public/Granted day:2014-12-25
Information query
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