Invention Grant
- Patent Title: Method for determining misalignment between a first and a second etching zones
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Application No.: US15879577Application Date: 2018-01-25
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Publication No.: US10211162B2Publication Date: 2019-02-19
- Inventor: Guido Rademaker , Salim Boutami , Jonathan Pradelles
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES
- Applicant Address: FR Paris
- Assignee: Commissariat A L'Energie Atomique et aux Energies Alternatives
- Current Assignee: Commissariat A L'Energie Atomique et aux Energies Alternatives
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1750759 20170130
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L23/544 ; G03F1/78 ; G03F1/84 ; G03F7/20 ; G01B11/27 ; H01J37/317 ; H01L21/67 ; H01L21/68 ; H01L21/66 ; G01N21/552
Abstract:
This method for measuring the misalignment between a first and a second etching zone includes: producing a plasmonic antenna including a first and a second element that are separate and each delineate a cavity on one respective side, all of the elements of the plasmonic antenna that are situated on a first side of a separating plane being produced entirely inside the first zone and all of the elements of the plasmonic antenna that are situated on the second side of the separating plane being produced entirely inside the second zone, and after the production of the plasmonic antenna, the method includes: measuring the absorption rate of the plasmonic antenna, and determining the magnitude of the misalignment between the first and second zones on the basis of the measured absorption rate and of a predicted value for this absorption rate in the absence of a misalignment.
Public/Granted literature
- US20180233456A1 METHOD FOR DETERMINING MISALIGNMENT BETWEEN A FIRST AND A SECOND ETCHING ZONES Public/Granted day:2018-08-16
Information query
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