- 专利标题: Blanking device for multi charged particle beams, and multi charged particle beam irradiation apparatus
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申请号: US15591767申请日: 2017-05-10
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公开(公告)号: US10224171B2公开(公告)日: 2019-03-05
- 发明人: Takanao Touya , Hiroshi Matsumoto , Munehiro Ogasawara , Hirofumi Morita
- 申请人: NuFlare Technology, Inc.
- 申请人地址: JP Yokohama-shi
- 专利权人: NuFlare Technology, Inc.
- 当前专利权人: NuFlare Technology, Inc.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Oblon, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2016-108726 20160531
- 主分类号: H01J37/04
- IPC分类号: H01J37/04 ; H01J37/317
摘要:
A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.
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