- Patent Title: Abnormality measuring method and abnormality measuring apparatus
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Application No.: US15286394Application Date: 2016-10-05
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Publication No.: US10281519B2Publication Date: 2019-05-07
- Inventor: Yao-Chung Hsu , Sen-Chia Chang , Tsung-Jung Hsieh
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Priority: TW105108996A 20160323
- Main IPC: G01R31/26
- IPC: G01R31/26 ; G08B21/18

Abstract:
An abnormality measuring method and an abnormality measuring apparatus of equipment are provided. The abnormality measuring method includes the following steps: acquiring a feature sequence corresponding to a life cycle according to recipe information and sensing information, wherein the feature sequence includes a plurality of feature subset sequences, and the life cycle is relative to a plurality of process runs; performing repeatedly a life segment analyzing process to acquire a plurality of life segments of the life cycle and each of the plurality of the feature subset sequences corresponding to one of the plurality of life segments; building a corresponding trending distribution of each of the plurality of life segments according to a corresponding feature subset sequence of the life segment; and determining whether to send an alarm message according to a plurality of trending distributions.
Public/Granted literature
- US20170276720A1 ABNORMALITY MEASURING METHOD AND ABNORMALITY MEASURING APPARATUS Public/Granted day:2017-09-28
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