- 专利标题: Method of partially infiltrating an at least partially leached polycrystalline diamond table and resultant polycrystalline diamond compacts
-
申请号: US12961787申请日: 2010-12-07
-
公开(公告)号: US10309158B2公开(公告)日: 2019-06-04
- 发明人: Debkumar Mukhopadhyay , Kenneth E. Bertagnolli , Jair J. Gonzalez
- 申请人: Debkumar Mukhopadhyay , Kenneth E. Bertagnolli , Jair J. Gonzalez
- 申请人地址: US UT Orem
- 专利权人: US SYNTHETIC CORPORATION
- 当前专利权人: US SYNTHETIC CORPORATION
- 当前专利权人地址: US UT Orem
- 代理机构: Dorsey & Whitney LLP
- 主分类号: E21B10/55
- IPC分类号: E21B10/55 ; B22F7/06 ; B24D3/10 ; C22C26/00 ; E21B10/567 ; E21B10/573 ; B22F5/00
摘要:
In an embodiment, a method of fabricating a polycrystalline diamond compact (“PDC”) includes forming a polycrystalline diamond (“PCD”) table in the presence of a metal-solvent catalyst in a first high-pressure/high-temperature (“HPHT”) process. The PCD table includes bonded diamond grains defining interstitial regions, with the metal-solvent catalyst disposed therein. The method includes at least partially leaching the PCD table to remove at least a portion of the metal-solvent catalyst therefrom. The method includes subjecting the at least partially leached PCD table and a substrate to a second HPHT process under diamond-stable temperature-pressure conditions to partially infiltrate the at least partially leached PCD table with an infiltrant. A maximum temperature (T), a total process time (t), and a maximum pressure (P) of the second HPHT process are chosen so that β is about 2° Celsius·hours/gigapascals (“° C.·h/GPa”) to about 325° C.·h/GPa, with β represented as β=T·t/P.
公开/授权文献
信息查询