Invention Grant
- Patent Title: Chemical liquid supply apparatus and semiconductor processing apparatus having the same
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Application No.: US15172740Application Date: 2016-06-03
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Publication No.: US10332762B2Publication Date: 2019-06-25
- Inventor: Young-hoo Kim , Il-sang Lee , In-gi Kim , Kyoung-hwan Kim , Hyo-san Lee , Sang-won Bae , Tae-hong Kim , Yong-jun Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2015-0123659 20150901
- Main IPC: H01L21/67
- IPC: H01L21/67

Abstract:
A chemical liquid supply apparatus includes a nozzle unit including a nozzle arm and an injection nozzle mounted in an end of the nozzle arm, a chemical liquid supply unit including a first chemical liquid tank accommodating a first chemical liquid and a second chemical liquid tank accommodating a second chemical liquid, and supplying the first chemical liquid and the second chemical liquid to the nozzle unit, and a mixer unit provided in the nozzle unit and discharging a process fluid by mixing the first chemical liquid and the second chemical liquid, wherein the mixer unit includes an in-line mixer mixing the first chemical liquid and the second chemical liquid that are continually injected from the chemical liquid supply unit, and a mixer pipe extending from the in-line mixer to the injection nozzle.
Public/Granted literature
- US20170062242A1 CHEMICAL LIQUID SUPPLY APPARATUS AND SEMICONDUCTOR PROCESSING APPARATUS HAVING THE SAME Public/Granted day:2017-03-02
Information query
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