Invention Grant
- Patent Title: Photosensitive resin composition, lithographic printing plate precursor and method for producing lithographic printing plate
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Application No.: US15279699Application Date: 2016-09-29
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Publication No.: US10338469B2Publication Date: 2019-07-02
- Inventor: Kotaro Asano , Atsuyasu Nozaki , Takashi Sato , Rena Mukaiyama , Kazuto Shimada
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2014-074366 20140331
- Main IPC: G03F7/32
- IPC: G03F7/32 ; G03F7/039 ; B41C1/10 ; G03F7/20 ; G03F7/095
Abstract:
A photosensitive resin composition contains a polymer compound having a constitutional unit represented by the following Formula A-1 as a constitutional unit A and at least one constitutional unit among constitutional units represented by the following Formulas B-1 to B-6 as a constitutional unit B in the main chain, and an infrared absorbing material.
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