Invention Grant
- Patent Title: Microchannel plate and electron multiplier
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Application No.: US15756217Application Date: 2016-08-09
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Publication No.: US10340129B2Publication Date: 2019-07-02
- Inventor: Takaaki Nagata , Yasumasa Hamana , Hajime Nishimura , Kimitsugu Nakamura
- Applicant: HAMAMATSU PHOTONICS K.K.
- Applicant Address: JP Hamamatsu-shi, Shizuoka
- Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee: HAMAMATSU PHOTONICS K.K.
- Current Assignee Address: JP Hamamatsu-shi, Shizuoka
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2015-174632 20150904
- International Application: PCT/JP2016/073490 WO 20160809
- International Announcement: WO2017/038410 WO 20170309
- Main IPC: H01J43/24
- IPC: H01J43/24 ; H01J9/12

Abstract:
A microchannel plate is provided with a substrate including a front surface, a rear surface, and a side surface, a plurality of channels penetrating from the front surface to the rear surface of the substrate, a first film provided on at least an inner wall surface of the channel, a second film provided on the first film, and electrode layers provided on the front surface and the rear surface of the substrate. The first film is made of Al2O3. The second film is made of SiO2. The first film is thicker than the second film.
Public/Granted literature
- US20180247802A1 MICROCHANNEL PLATE AND ELECTRON MULTIPLIER Public/Granted day:2018-08-30
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