Invention Grant
- Patent Title: Titanium compound based hard mask films
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Application No.: US15268797Application Date: 2016-09-19
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Publication No.: US10347488B2Publication Date: 2019-07-09
- Inventor: Rui Cheng , Wei Tang , Pramit Manna , Abhijit Basu Mallick , Srinivas Gandikota
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/033
Abstract:
Methods for forming a titanium-containing hard mask film on a substrate surface by exposing the substrate surface to a titanium-containing precursor. The titanium-containing hard mask comprises one or more of silicon, oxygen or carbon atoms and, optionally, nitrogen atoms.
Public/Granted literature
- US20170084459A1 Titanium-Compound Based Hard Mask Films Public/Granted day:2017-03-23
Information query
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