- 专利标题: Variable stealth laser dicing process
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申请号: US15701849申请日: 2017-09-12
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公开(公告)号: US10347534B2公开(公告)日: 2019-07-09
- 发明人: Martin Lapke , Hartmut Buenning , Sascha Moeller , Guido Albermann , Michael Zernack , Leo M. Higgins, III
- 申请人: NXP B.V.
- 申请人地址: NL Eindhoven
- 专利权人: NXP B.V.
- 当前专利权人: NXP B.V.
- 当前专利权人地址: NL Eindhoven
- 代理商 Senaida B. San Miguel
- 主分类号: H01L21/78
- IPC分类号: H01L21/78 ; H01L21/268 ; H01L21/304 ; H01L21/683
摘要:
Embodiments are provided herein for separating integrated circuit (IC) device die of a wafer, the wafer having a front side with an active device region and a back side, the active device region having a plurality of active devices arranged in rows and columns and separated by cutting lanes, the method including: attaching the front side of the wafer onto a first dicing tape; forming a modification zone within each cutting lane through the back side of the wafer, wherein each modification zone has a first thickness near a corner of each active device and a second thickness near a center point of each active device, wherein the second thickness is less than the first thickness; and propagating cracks through each cutting lane to separate the plurality of active devices.
公开/授权文献
- US20190080963A1 VARIABLE STEALTH LASER DICING PROCESS 公开/授权日:2019-03-14
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