发明授权
- 专利标题: Gallium nitride wafer substrate for solid state lighting devices and associated systems
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申请号: US14690154申请日: 2015-04-17
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公开(公告)号: US10347794B2公开(公告)日: 2019-07-09
- 发明人: Anthony Lochtefeld , Hugues Marchand
- 申请人: QROMIS, Inc.
- 申请人地址: US CA Santa Clara
- 专利权人: Qromis, Inc.
- 当前专利权人: Qromis, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Kilpatrick Townsend & Stockton LLP
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L33/48 ; C30B29/06 ; C30B33/10 ; H01L21/02 ; H01L33/32 ; H01L33/16 ; H01S5/323
摘要:
Gallium nitride wafer substrate for solid state lighting devices, and associated systems and methods. A method for making an SSL device substrate in accordance with one embodiment of the disclosure includes forming multiple crystals carried by a support member, with the crystals having an orientation selected to facilitate formation of gallium nitride. The method can further include forming a volume of gallium nitride carried by the crystals, with the selected orientation of the crystals at least partially controlling a crystal orientation of the gallium nitride, and without bonding the gallium nitride, as a unit, to the support member. In other embodiments, the number of crystals can be increased by a process that includes annealing a region in which the crystals are present, etching the region to remove crystals having an orientation other than the selected orientation, and/or growing the crystals having the selected orientation.
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