- 专利标题: Resistive memory cells including localized filamentary channels, devices including the same, and methods of making the same
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申请号: US15528674申请日: 2014-12-18
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公开(公告)号: US10355205B2公开(公告)日: 2019-07-16
- 发明人: Prashant Majhi , Ravi Pillarisetty , Niloy Mukherjee , Uday Shah , Elijah V. Karpov , Brian S. Doyle , Robert S. Chau
- 申请人: Prashant Majhi , Ravi Pillarisetty , Niloy Mukherjee , Uday Shah , Elijah V. Karpov , Brian S. Doyle , Robert S. Chau
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Grossman, Tucker, Perreault & Pfleger, PLLC
- 国际申请: PCT/US2014/071173 WO 20141218
- 国际公布: WO2016/099511 WO 20160623
- 主分类号: H01L29/08
- IPC分类号: H01L29/08 ; H01L45/00
摘要:
Resistive memory cells are described. In some embodiments, the resistive memory cells include a switching layer having an inner region in which one or more filaments is formed. In some instances, the filaments is/are formed only within the inner region of the switching layer. Methods of making such resistive memory cells and devices including such cells are also described.
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