- 专利标题: Integrated scanning electron microscopy and optical analysis techniques for advanced process control
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申请号: US16103386申请日: 2018-08-14
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公开(公告)号: US10359706B1公开(公告)日: 2019-07-23
- 发明人: Hari Pathangi Sriraman , Sivaprrasath Meenakshisundaram , Arun Lobo
- 申请人: KLA-Tencor Corporation
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Corporation
- 当前专利权人: KLA-Tencor Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: Suiter Swantz pc llo
- 优先权: IN201841021710 20180611; IN201841023172 20180621
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
A sample analysis system includes a scanning electron microscope, an optical and/or eBeam inspection system, and an optical metrology system. The system further includes at least one controller. The controller is configured to receive a first plurality of selected regions of interest of the sample; generate a first critical dimension uniformity map based on a first inspection performed by the scanning electron microscope at the first selected regions of interest; determine a second plurality of selected regions of interest based on the first critical dimension uniformity map; generate a second critical dimension uniformity map based on a second inspection performed by the optical and/or eBeam inspection system at the second selected regions of interest; and determine one or more process tool control parameters based on inspection results and on overlay measurements performed on the sample by the optical metrology system.