Invention Grant
- Patent Title: Photosensitive resin composition, planographic printing plate precursor, method for producing planographic printing plate, and polymer compound
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Application No.: US15448570Application Date: 2017-03-02
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Publication No.: US10363733B2Publication Date: 2019-07-30
- Inventor: Atsuyasu Nozaki , Takashi Sato , Rena Mukaiyama
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Solaris Intellectual Property Group, PLLC
- Priority: JP2014-196598 20140926
- Main IPC: G03F7/32
- IPC: G03F7/32 ; B41C1/10 ; G03F7/00 ; G03F7/004 ; G03F7/039 ; G03F7/095 ; B41N1/14 ; C08G73/02 ; G03F7/11 ; G03F7/20

Abstract:
Provided are a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent chemical resistance and excellent printing durability, a lithographic printing plate precursor obtained by using the photosensitive resin composition, a method for producing a lithographic printing plate, and a new polymer compound. The photosensitive resin composition of the present invention contains: a polymer compound which has an amine bond or a quaternary ammonium salt bond, and at least one bond selected from the group consisting of a urea bond, a urethane bond, and a carbonate bond in the main chain and has a sulfonamide group or a phenolic hydroxyl group in the main chain and/or the side chain; and an infrared absorbing material.
Public/Granted literature
Information query
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