公开(公告)号：US10649337B2

公开(公告)日：2020-05-12

申请号：US16351513

申请日：2019-03-13

Applicant: FUJIFILM CORPORATION

Inventor： Takashi Sato ,  Rena Mukaiyama ,  Yuichi Yasuhara

IPC: G03F7/30 ,  G03F7/033 ,  G03F7/035 ,  G03F7/095 ,  G03F7/032 ,  G03F7/11 ,  G03F7/00 ,  G03F7/004 ,  B41C1/10

Abstract: Provided is a positive type lithographic printing plate precursor including at least: a support which has a hydrophilic surface or a hydrophilic layer; and an underlayer, an interlayer, and an upper layer on the support in this order, in which the underlayer contains a polymer compound 1 which has at least one structure selected from the group consisting of a urethane bond, an acetal structure, and a urea bond in a main chain, the interlayer contains a polymer compound 2 which has at least one structure selected from the group consisting of a sulfonamide group, an active imide group, and a urea bond in a side chain, the upper layer contains a polymer compound 3 which has a phenolic hydroxy group, and one or more layers among the underlayer, the interlayer, and the upper layer contain an infrared absorbent. Further, provided are a method of producing the positive type lithographic printing plate precursor and a method of preparing a lithographic printing plate using the positive type lithographic printing plate precursor.

公开(公告)号：US10564545B2

公开(公告)日：2020-02-18

申请号：US15278715

申请日：2016-09-28

Applicant: FUJIFILM Corporation

Inventor： Rena Mukaiyama ,  Atsuyasu Nozaki ,  Takashi Sato ,  Kotaro Asano

IPC: G03F7/32 ,  G03F7/039 ,  B41C1/10 ,  G03F7/09 ,  G03F7/20

Abstract: A photosensitive resin composition contains a polymer compound having a linking group represented by Formula A-1 in the main chain; and an infrared absorbing material. In Formula A-1, R1 and R2 each independently represent a hydrogen atom or a monovalent organic group, and X1 is a specific linking group.

公开(公告)号：US10338469B2

公开(公告)日：2019-07-02

申请号：US15279699

申请日：2016-09-29

Applicant: FUJIFILM Corporation

Inventor： Kotaro Asano ,  Atsuyasu Nozaki ,  Takashi Sato ,  Rena Mukaiyama ,  Kazuto Shimada

IPC: G03F7/32 ,  G03F7/039 ,  B41C1/10 ,  G03F7/20 ,  G03F7/095

Abstract: A photosensitive resin composition contains a polymer compound having a constitutional unit represented by the following Formula A-1 as a constitutional unit A and at least one constitutional unit among constitutional units represented by the following Formulas B-1 to B-6 as a constitutional unit B in the main chain, and an infrared absorbing material.

公开(公告)号：US10363733B2

公开(公告)日：2019-07-30

申请号：US15448570

申请日：2017-03-02

Applicant: FUJIFILM CORPORATION

Inventor： Atsuyasu Nozaki ,  Takashi Sato ,  Rena Mukaiyama

IPC: G03F7/32 ,  B41C1/10 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/095 ,  B41N1/14 ,  C08G73/02 ,  G03F7/11 ,  G03F7/20

Abstract: Provided are a photosensitive resin composition which enables production of a lithographic printing plate precursor having a non-image portion which has good solubility in an alkali aqueous solution and which enables production of a lithographic printing plate having excellent chemical resistance and excellent printing durability, a lithographic printing plate precursor obtained by using the photosensitive resin composition, a method for producing a lithographic printing plate, and a new polymer compound. The photosensitive resin composition of the present invention contains: a polymer compound which has an amine bond or a quaternary ammonium salt bond, and at least one bond selected from the group consisting of a urea bond, a urethane bond, and a carbonate bond in the main chain and has a sulfonamide group or a phenolic hydroxyl group in the main chain and/or the side chain; and an infrared absorbing material.