Invention Grant
- Patent Title: Gas distribution system for ceramic showerhead of plasma etch reactor
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Application No.: US15005877Application Date: 2016-01-25
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Publication No.: US10366865B2Publication Date: 2019-07-30
- Inventor: Michael Kang , Alex Paterson
- Applicant: LAM RESEARCH CORPORATION
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Main IPC: B01F15/02
- IPC: B01F15/02 ; C23C16/455 ; H01J37/32 ; H01L21/67 ; H01L21/3065 ; H01L21/311

Abstract:
A gas delivery system for a ceramic showerhead includes gas connection blocks and a gas ring, the gas connection blocks mounted on the gas ring such that gas outlets in the blocks deliver process gas to gas inlets in an outer periphery of the showerhead. The gas ring includes a bottom ring with channels therein and a welded cover plate enclosing the channels. The gas ring can include a first channel extending ½ the length of the gas ring, two second channels connected at midpoints thereof to downstream ends of the first channel, and four third channels connected at midpoints thereof to downstream ends of the second channels. the cover plate can include a first section enclosing the first channel, two second sections connected at midpoints thereof to ends of the first section, and third sections connected at midpoints thereof to ends of the second sections. The channels are arranged such that the process gas travels equal distances for a single gas inlet in the gas ring to eight outlets in the cover ring allowing equal gas flow.
Public/Granted literature
- US20160217977A1 Gas Distribution System For Ceramic Showerhead of Plasma Etch Reactor Public/Granted day:2016-07-28
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