Invention Grant
- Patent Title: Carbon nanotube field-effect transistor with sidewall-protected metal contacts
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Application No.: US15207938Application Date: 2016-07-12
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Publication No.: US10367158B2Publication Date: 2019-07-30
- Inventor: Shu-Jen Han , Jianshi Tang
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L51/05
- IPC: H01L51/05 ; H01L51/00 ; H01L51/10

Abstract:
A field effect transistor includes a substrate and a gate dielectric formed on the substrate. A channel material is formed on the dielectric layer. The channel material includes carbon nanotubes. A patterned resist layer has openings formed therein. Metal contacts are formed on the channel material in the openings in the patterned resist layer and over portions of the patterned resist layer to protect sidewalls of the metal contacts to prevent degradation of the metal contacts.
Public/Granted literature
- US20170125709A1 CARBON NANOTUBE FIELD-EFFECT TRANSISTOR WITH SIDEWALL-PROTECTED METAL CONTACTS Public/Granted day:2017-05-04
Information query
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