Invention Grant
- Patent Title: Semiconductor device having electro-static discharge protection structure
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Application No.: US15764394Application Date: 2016-08-24
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Publication No.: US10373945B2Publication Date: 2019-08-06
- Inventor: Zheng Bian
- Applicant: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Applicant Address: CN Wuxi New District
- Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee: CSMC TECHNOLOGIES FAB2 CO., LTD.
- Current Assignee Address: CN Wuxi New District
- Agency: Polsinelli PC
- Priority: CN201510641962 20150930
- International Application: PCT/CN2016/096527 WO 20160824
- International Announcement: WO2017/054595 WO 20170406
- Main IPC: H01L29/16
- IPC: H01L29/16 ; H01L29/866 ; H01L27/02 ; H01L27/06 ; H01L29/78 ; H01L29/06

Abstract:
A semiconductor device, having an electro-static discharge (ESD) protection structure, comprises: a diode, connected between a gate and a source of the semiconductor device, and comprising a diode main body, and two connection portions, respectively connected to two terminals of the diode main body and respectively electrically connected to the gate and the source; and a substrate comprising two insulation pads disposed thereon and separated from each other. A surface of the substrate between the insulation pads is provided with an insulation layer. The diode main body is arranged on the insulation layer. The two connection portions are configured to extend, respectively, from either end of the diode main body to the insulation pad on the corresponding side. A dielectric layer is arranged on the diode and the two insulation pads, and a metal conduction line layer is arranged on the dielectric layer.
Public/Granted literature
- US20180277532A1 SEMICONDUCTOR DEVICE HAVING ELECTRO-STATIC DISCHARGE PROTECTION STRUCTURE Public/Granted day:2018-09-27
Information query
IPC分类: