Invention Grant
- Patent Title: Bipolar transistor and method of manufacturing the same
-
Application No.: US15840890Application Date: 2017-12-13
-
Publication No.: US10374069B2Publication Date: 2019-08-06
- Inventor: Pascal Chevalier
- Applicant: STMicroelectronics SA
- Applicant Address: FR Montrouge
- Assignee: STMicroelectronics SA
- Current Assignee: STMicroelectronics SA
- Current Assignee Address: FR Montrouge
- Agency: Crowe & Dunlevy
- Priority: FR1651251 20160216
- Main IPC: H01L29/08
- IPC: H01L29/08 ; H01L29/10 ; H01L29/66 ; H01L21/308 ; H01L29/732 ; H01L29/737

Abstract:
A bipolar transistor is supported by a single-crystal silicon substrate including a collector contact region. A first epitaxial region forms a collector region of a first conductivity type on the collector contact region. A second epitaxial region forms a base region of a second conductivity type. Deposited semiconductor material forms an emitter region of the first conductivity type. The collector region, base region and emitter region are located within an opening having sidewalls lined with an insulating sheath. A portion of the insulating sheath adjacent the base region is removed and a base contact region is formed by epitaxial material grown from a portion of the base region exposed by removal of the portion of the insulating sheath.
Public/Granted literature
- US20180108762A1 BIPOLAR TRANSISTOR AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2018-04-19
Information query
IPC分类: