Invention Grant
- Patent Title: Laser-markable polyamide composition
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Application No.: US15311346Application Date: 2015-05-18
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Publication No.: US10377897B2Publication Date: 2019-08-13
- Inventor: Raul Marcelino Perez Graterol , Franciscus Gerardus Henricus Van Duijnhoven , Franciscus Wilhelmus Maria Gelissen , Johannes Hoekstra
- Applicant: DSM IP ASSETS B.V.
- Applicant Address: NL Heerlen
- Assignee: DSM IP ASSETS B.V.
- Current Assignee: DSM IP ASSETS B.V.
- Current Assignee Address: NL Heerlen
- Agency: Nixon & Vanderhye P.C.
- Priority: EP14169033 20140520
- International Application: PCT/EP2015/060894 WO 20150518
- International Announcement: WO2015/177092 WO 20151126
- Main IPC: C08L77/00
- IPC: C08L77/00 ; C08L77/02 ; B41M5/26 ; C08J3/22 ; C08J3/20 ; C08K3/22 ; C08K5/098 ; C08K5/3492 ; C08K7/14 ; C08L77/06

Abstract:
The invention relates to a laser-markable polyamide composition comprising: a first phase comprising Sb2O3 and an aliphatic polyamide with an amide density AD1, and a second phase comprising an aliphatic polyamide with an amide density AD2, wherein AD1-AD2 is at least 0.01, and wherein the amount of Sb2O3 is between 0.1 and 5 wt %, a halogen-free flame retardant in an amount of between 1 to 25 wt %, wherein the amount in weight percentage are based on the total amount of composition. The invention also relates to a process for preparing a laser-markable polyamide composition, as well as laser-marked products comprising the composition.
Public/Granted literature
- US20170081513A1 LASER-MARKABLE POLYAMIDE COMPOSITION Public/Granted day:2017-03-23
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