Invention Grant
- Patent Title: Transformer, plasma processing apparatus, and plasma processing method
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Application No.: US15494131Application Date: 2017-04-21
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Publication No.: US10381197B2Publication Date: 2019-08-13
- Inventor: Yohei Yamazawa
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Nath, Goldberg & Meyer
- Agent Jerald L. Meyer
- Priority: JP2016-089389 20160427
- Main IPC: H01F27/00
- IPC: H01F27/00 ; H03H7/00 ; H01F38/14 ; H01F38/18 ; H01J37/32 ; H01L21/67 ; H01L21/3065

Abstract:
A transformer includes: a rotary shaft configured to rotate about a central axis of the rotary shaft as a rotational axis; a primary-side first coil configured to extend around a first axis perpendicular to the central axis; a secondary-side second coil configured to extend around a second axis and supported by the rotary shaft, the second axis being perpendicular to the rotational axis in an area surrounded by the first coil; and a secondary-side third coil configured to extend around a third axis and supported by the rotary shaft, the third axis being perpendicular to the rotational axis and forming a predetermined angle with the second axis in the area.
Public/Granted literature
- US20170316948A1 TRANSFORMER, PLASMA PROCESSING APPARATUS, AND PLASMA PROCESSING METHOD Public/Granted day:2017-11-02
Information query
IPC分类:
H | 电学 |
H01 | 基本电气元件 |
H01F | 磁体;电感;变压器;磁性材料的选择 |
H01F27/00 | 变压器或电感器的一般零部件 |