Invention Grant
- Patent Title: Method for verifying mask data in computing device
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Application No.: US15442780Application Date: 2017-02-27
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Publication No.: US10394115B2Publication Date: 2019-08-27
- Inventor: Dong-Kil Yun , Sunghoon Kim , Jae-Eun Lee , Hyangja Yang
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine, Whitt & Francos, PLLC
- Priority: KR10-2016-0044907 20160412
- Main IPC: G03F1/36
- IPC: G03F1/36 ; G06F17/50
Abstract:
A method for verifying mask data in a computing device includes receiving layout data, receiving mask data, determining an interaction number between a pattern corresponding to the layout data and a pattern corresponding to the mask data, and detecting an error of the mask data based on the interaction number.
Public/Granted literature
- US20170293219A1 METHOD FOR VERIFYING MASK DATA IN COMPUTING DEVICE Public/Granted day:2017-10-12
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