Invention Grant
- Patent Title: Layout pattern for SRAM and manufacturing methods thereof
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Application No.: US16171339Application Date: 2018-10-25
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Publication No.: US10396064B2Publication Date: 2019-08-27
- Inventor: Jun-Jie Wang , Yu-Lin Wang , Tzu-Feng Chang , Wei-Chi Lee
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu
- Agent Winston Hsu
- Priority: TW105105522A 20160224
- Main IPC: H01L27/02
- IPC: H01L27/02 ; G03F1/36 ; G06F17/50 ; G11C11/419 ; G11C11/412 ; H01L27/11

Abstract:
The present invention provides a layout pattern of a static random access memory (SRAM). The layout pattern includes a first inverter and a second inverter constituting a latch circuit, wherein the latch circuit includes four transistors, a first access transistor (PG1) and a second access transistor (PG2) being electrically connected to the latch circuit, wherein the first access transistor is electrically connected to a first word line and a first bit line, and the second access transistor is electrically connected to a second word line and a second bit line, the first access transistor has a first gate length, the first access transistor has a second gate length, and the first gate length is different from the second gate length, and two read transistors series connected to each other, wherein one of the two read transistors is connected to the latch circuit.
Public/Granted literature
- US20190067268A1 LAYOUT PATTERN FOR SRAM AND MANUFACTURING METHODS THEREOF Public/Granted day:2019-02-28
Information query
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