- Patent Title: EUV light generator including collecting mirror having drip hole
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Application No.: US15172390Application Date: 2016-06-03
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Publication No.: US10401602B2Publication Date: 2019-09-03
- Inventor: Hoyeon Kim , Seongsue Kim
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2015-0122923 20150831
- Main IPC: G02B19/00
- IPC: G02B19/00 ; H05G2/00 ; G21K1/06

Abstract:
An extreme ultraviolet (EUV) light generator includes a collecting mirror having a first focal point and a second focal point, the first focal point being closer to the collecting mirror than the second focal point, a laser to generate a laser beam and to radiate the laser beam toward the first focal point of the collecting mirror, and a droplet generator to generate a droplet and to discharge the droplet at the first focal point of the collecting mirror, wherein the collecting mirror includes a concave reflective surface, a through hole in a center of the reflective surface, and a drip hole between the through hole and an outer circumferential surface of the reflective surface.
Public/Granted literature
- US20170059837A1 EUV LIGHT GENERATOR INCLUDING COLLECTING MIRROR HAVING DRIP HOLE Public/Granted day:2017-03-02
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B19/00 | 聚光镜(用于显微镜的入G02B21/08) |