Invention Grant
- Patent Title: Method of manufacturing a MEMS DVC device
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Application No.: US15629161Application Date: 2017-06-21
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Publication No.: US10403442B2Publication Date: 2019-09-03
- Inventor: Robertus Petrus Van Kampen , Ramadan A. Alhalabi
- Applicant: CAVENDISH KINETICS, INC.
- Applicant Address: US CA San Jose
- Assignee: CAVENDISH KINETICS, INC.
- Current Assignee: CAVENDISH KINETICS, INC.
- Current Assignee Address: US CA San Jose
- Agency: Patterson & Sheridan, LLP
- Agent Steven Versteeg
- Main IPC: H01G5/011
- IPC: H01G5/011 ; H01G5/16 ; H01H59/00 ; H01G5/18 ; H01G5/013

Abstract:
The present invention generally relates to a MEMS DVC having a shielding electrode structure between the RF electrode and one or more other electrodes that cause a plate to move. The shielding electrode structure may be grounded and, in essence, block or shield the RF electrode from the one or more electrodes that cause the plate to move. By shielding the RF electrode, coupling of the RF electrode to the one or more electrodes that cause the plate to move is reduced and capacitance modulation is reduced or even eliminated.
Public/Granted literature
- US20170287646A1 CONTROL-ELECTRODE SHIELDING FOR IMPROVED LINEARITY OF A MEMS DVC DEVICE Public/Granted day:2017-10-05
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