Invention Grant
- Patent Title: Nitride semiconductor device including a horizontal switching device
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Application No.: US15578403Application Date: 2016-06-14
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Publication No.: US10403745B2Publication Date: 2019-09-03
- Inventor: Yasushi Higuchi , Shinichi Hoshi , Kazuhiro Oyama
- Applicant: DENSO CORPORATION
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2015-140825 20150714
- International Application: PCT/JP2016/002871 WO 20160614
- International Announcement: WO2017/010040 WO 20170119
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/08 ; H01L29/40 ; H01L29/423 ; H01L29/66 ; H01L29/20 ; H01L29/78 ; H01L29/10

Abstract:
A nitride semiconductor device includes a horizontal switching device that includes a substrate, a channel forming layer, a source region, a drain region and a gate region. The source region and the drain region are arranged apart from each other in one direction along a plane of the substrate. The gate region is formed of a p-type semiconductor layer and is arranged between the source region and the drain region. The gate region is divided into multiple parts in a perpendicular direction along the plane of the substrate, the perpendicular direction being perpendicular to an arrangement direction in which the source region and the drain region are arranged. Accordingly, on-resistance is decreased while securing high breakdown voltage.
Public/Granted literature
- US20180219086A1 NITRIDE SEMICONDUCTOR DEVICE Public/Granted day:2018-08-02
Information query
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