Invention Grant
- Patent Title: Structure of gas sensor
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Application No.: US15493120Application Date: 2017-04-20
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Publication No.: US10408780B2Publication Date: 2019-09-10
- Inventor: Chia-Wei Lee , Chang-Sheng Hsu , Chih-Fan Hu , Chin-Jen Cheng , Chang Hsin Wu
- Applicant: UNITED MICROELECTRONICS CORPORATION
- Applicant Address: TW Hsinchu
- Assignee: UNITED MICROELECTRONICS CORPORATION
- Current Assignee: UNITED MICROELECTRONICS CORPORATION
- Current Assignee Address: TW Hsinchu
- Agent Ding Yu Tan
- Main IPC: G01N27/12
- IPC: G01N27/12

Abstract:
The present invention provides a structure of a gas sensor, comprising: a support, having a front side, a back side opposite to the front side, a cell region, and a peripheral region circling the cell region; a cavity, formed on the back side of the support in the cell region; a heater, disposed on the front side of the support covering the cavity; a sensing element, disposed on the heater; and a sealing layer, formed on the back side of the support covering inside the cavity.
Public/Granted literature
- US20180306738A1 STRUCTURE OF GAS SENSOR Public/Granted day:2018-10-25
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