Invention Grant
- Patent Title: Waveguide fabrication with sacrificial sidewall spacers
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Application No.: US15992845Application Date: 2018-05-30
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Publication No.: US10409001B2Publication Date: 2019-09-10
- Inventor: Michael Yu-tak Young , Wayne McMillan , Rutger Meyer Timmerman Thijssen , Robert Jan Visser
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: G02B6/34
- IPC: G02B6/34 ; G02B6/122 ; G06F3/01 ; G02B27/01 ; G02B6/12

Abstract:
Embodiments described herein relate to apparatus and methods for display structure fabrication. In one embodiment, a waveguide structure having an input grating structure and an output grating structure is fabricated and a spacer material is deposited on the waveguide. The spacer material is etched from various portions of the waveguide structure and a high refractive index material is deposited on the waveguide. Portions of the spacer material remaining on the waveguide structure are removed leaving the high refractive index material disposed on desired surfaces of the waveguide structure.
Public/Granted literature
- US20180348429A1 WAVEGUIDE FABRICATION WITH SACRIFICIAL SIDEWALL SPACERS Public/Granted day:2018-12-06
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