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公开(公告)号：US11187836B2
公开(公告)日：2021-11-30
申请号：US16293354
申请日：2019-03-05
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Ludovic Godet , Robert Jan Visser , Naamah Argaman , Christopher Dennis Bencher , Wayne McMillan
Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a substrate without planarization. The method includes depositing a material stack to be patterned on a substrate, depositing and patterning a thick mask material on a portion of the material stack, etching the material stack down one level, trimming a side portion of the thick mask material, etching the material stack down one more level, repeating trim and etch steps above ‘n’ times, and stripping the thick mask material from the material stack.
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公开(公告)号：US10409001B2
公开(公告)日：2019-09-10
申请号：US15992845
申请日：2018-05-30
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Wayne McMillan , Rutger Meyer Timmerman Thijssen , Robert Jan Visser
Abstract: Embodiments described herein relate to apparatus and methods for display structure fabrication. In one embodiment, a waveguide structure having an input grating structure and an output grating structure is fabricated and a spacer material is deposited on the waveguide. The spacer material is etched from various portions of the waveguide structure and a high refractive index material is deposited on the waveguide. Portions of the spacer material remaining on the waveguide structure are removed leaving the high refractive index material disposed on desired surfaces of the waveguide structure.
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Patent Agency Ranking
公开(公告)号：US11043437B2
公开(公告)日：2021-06-22
申请号：US16241427
申请日：2019-01-07
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Ludovic Godet , Robert Jan Visser
Abstract: Embodiments of the present disclosure generally relate to an optically transparent substrate, comprising a major surface having a peripheral edge region with an orientation feature formed therein, and a texture formed on the peripheral edge region, the texture having an opacity that is greater than an opacity of the major surface.
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公开(公告)号：US10955606B2
公开(公告)日：2021-03-23
申请号：US16191340
申请日：2018-11-14
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Ludovic Godet , Robert Jan Visser , Wayne McMillan
Abstract: Embodiments described herein relate to methods of fabricating waveguide structures with gratings having front angles less than about 45° and back angles less than about 45°. The methods include imprinting stamps into nanoimprint resists disposed on substrates. The nanoimprint resists are subjected to a cure process. The stamps are released from the nanoimprint resist at a release angle ϑ using a release method. The nanoimprint resists are subjected to an anneal process to form a waveguide structure comprising a plurality of gratings with a front angle α and a back angle β relative to a second plane of the surface of the substrate less than about 45°.
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公开(公告)号：US11662516B2
公开(公告)日：2023-05-30
申请号：US17730280
申请日：2022-04-27
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Wayne McMillan , Rutger Meyer Timmerman Thijssen , Robert Jan Visser
CPC classification number: G02B6/0065 , G02B6/0038 , G03F7/0002 , G03F7/0005
Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.
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公开(公告)号：US11327218B2
公开(公告)日：2022-05-10
申请号：US16762869
申请日：2018-11-13
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Wayne McMillan , Rutger Meyer Timmerman Thijssen , Robert Jan Visser
Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.
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公开(公告)号：US20200219819A1
公开(公告)日：2020-07-09
申请号：US16241427
申请日：2019-01-07
Applicant: Applied Materials, Inc.
Inventor： Michael Yu-tak Young , Ludovic Godet , Robert Jan Visser
IPC: H01L23/544 , H01L21/67 , G03F9/00
Abstract: Embodiments of the present disclosure generally relate to an optically transparent substrate, comprising a major surface having a peripheral edge region with an orientation feature formed therein, and a texture formed on the peripheral edge region, the texture having an opacity that is greater than an opacity of the major surface.
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