- Patent Title: External substrate rotation in a semiconductor processing system
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Application No.: US15091260Application Date: 2016-04-05
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Publication No.: US10431480B2Publication Date: 2019-10-01
- Inventor: Tuan Anh Nguyen , Amit Kumar Bansal , Juan Carlos Rocha-Alvarez
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson + Sheridan LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/687 ; H01L21/66 ; H01L21/02
Abstract:
A method and apparatus for processing a semiconductor is disclosed herein. In one embodiment, a processing system for semiconductor processing is disclosed. The processing chamber includes two transfer chambers, a processing chamber, and a rotation module. The processing chamber is coupled to the transfer chamber. The rotation module is positioned between the transfer chambers. The rotation module is configured to rotate the substrate. The transfer chambers are configured to transfer the substrate between the processing chamber and the transfer chamber. In another embodiment, a method for processing a substrate on the apparatus is disclosed herein.
Public/Granted literature
- US20160315000A1 EXTERNAL SUBSTRATE ROTATION IN A SEMICONDUCTOR PROCESSING SYSTEM Public/Granted day:2016-10-27
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