Invention Grant
- Patent Title: Chemical liquid supply apparatus and semiconductor processing apparatus having the same
-
Application No.: US15814842Application Date: 2017-11-16
-
Publication No.: US10435234B2Publication Date: 2019-10-08
- Inventor: Yong Jhin Cho , In Kwang Bae , Jung Min Oh , Mi Hyun Park , Kun Tack Lee , Yong Jun Choi
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2017-0061842 20170518
- Main IPC: B05B5/025
- IPC: B05B5/025 ; B05C11/10 ; B65D85/00 ; B65D90/46 ; G01R29/24 ; C09D5/24 ; C08L27/20 ; H01L21/67 ; C08F14/26 ; C08K3/04 ; C08F14/22

Abstract:
A chemical liquid supply apparatus includes a storage container configured to accommodate a chemical liquid for processing a semiconductor substrate, a chemical liquid supply pipe, a supply nozzle, and a grounding conductor. A conductive layer including a non-metallic conductive material is formed on an inner surface of the chemical liquid supply pipe. The supply nozzle includes a non-metallic conductive material. The conductive layer or the supply nozzle is electrically connected to the grounding conductor which is grounded to an outside of the pipe.
Public/Granted literature
- US20180334318A1 CHEMICAL LIQUID SUPPLY APPARATUS AND SEMICONDUCTOR PROCESSING APPARATUS HAVING THE SAME Public/Granted day:2018-11-22
Information query