Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
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Application No.: US15280308Application Date: 2016-09-29
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Publication No.: US10438861B2Publication Date: 2019-10-08
- Inventor: Hideki Aono , Makoto Ogasawara , Naohito Suzumura , Tetsuya Yoshida
- Applicant: Renesas Electronics Corporation
- Applicant Address: JP Koutou-ku, Tokyo
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Koutou-ku, Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2015-194127 20150930
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G01R31/26 ; H01L29/78

Abstract:
To predict a temperature rise amount due to self-heating of a resistance value of a gate electrode with high accuracy in an HCI accelerated stress test. A gate electrode for gate resistance measurement (for temperature monitoring) that has contacts on its both sides, respectively, is disposed adjacent to the gate electrode. At the time of gate ON of the gate electrode, voltages that are substantially the same voltages as that of the gate electrode and have a minute potential difference between its contacts are applied between the contacts of the gate electrode for gate resistance measurement (for temperature monitoring), and a resistance value of the gate electrode for gate resistance measurement (for temperature monitoring) is measured.
Public/Granted literature
- US20170092555A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2017-03-30
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