Invention Grant
- Patent Title: 193nm laser and inspection system
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Application No.: US15901388Application Date: 2018-02-21
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Publication No.: US10439355B2Publication Date: 2019-10-08
- Inventor: Yung-Ho Chuang , J. Joseph Armstrong , Yujun Deng , Justin Dianhuan Liou , Vladimir Dribinski , John Fielden
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Bever, Hoffman & Harms, LLP
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G02B17/08 ; H01S3/23 ; H01S3/00 ; H01S3/30 ; H01S3/10 ; H01S3/067 ; H01S3/16 ; H01S3/11 ; G02F1/35 ; G02F1/39

Abstract:
An optical inspection system that utilizes sub-200 nm incident light beam to inspect a surface of an object for defects is described. The sub-200 nm incident light beam is generated by combining first light having a wavelength of about 1109 nm with second light having a wavelength of approximately 234 nm. An optical system includes optical components configured to direct the incident light beam to a surface of the object, and image relay optics are configured to collect and relay at least two channels of light to a sensor, where at least one channel includes light reflected from the object, and at least one channel includes light transmitted through the object. The sensor is configured to simultaneously detect both the reflected and transmitted light. A laser for generating the sub-200 nm incident light beam includes a fundamental laser, two or more harmonic generators, a frequency doubler and a two frequency mixing stages.
Public/Granted literature
- US20180191126A1 193nm Laser And Inspection System Public/Granted day:2018-07-05
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