Invention Grant
- Patent Title: Die with integrated microphone device using through-silicon vias (TSVs)
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Application No.: US15502495Application Date: 2014-09-17
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Publication No.: US10455308B2Publication Date: 2019-10-22
- Inventor: Kevin J. Lee , Ruchir Saraswat , Uwe Zillmann , Valluri Bob Rao , Tor Lund-Larsen , Nicholas P. Cowley
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- International Application: PCT/US2014/056133 WO 20140917
- International Announcement: WO2016/043738 WO 20160324
- Main IPC: H04R19/04
- IPC: H04R19/04 ; H04R1/04 ; B81B7/02 ; H01L23/00 ; H01L21/683 ; H01L23/48 ; B81C1/00 ; H01L21/768 ; H04R1/40 ; H04R19/00

Abstract:
Embodiments of the present disclosure describe a die with integrated microphone device using through-silicon vias (TSVs) and associated techniques and configurations. In one embodiment, an apparatus includes an apparatus comprising a semiconductor substrate having a first side and a second side disposed opposite to the first side, an interconnect layer formed on the first side of the semiconductor substrate, a through-silicon via (TSV) formed through the semiconductor substrate and configured to route electrical signals between the first side of the semiconductor substrate and the second side of the semiconductor substrate, and a microphone device formed on the second side of the semiconductor substrate and electrically coupled with the TSV. Other embodiments may be described and/or claimed.
Public/Granted literature
- US20170245035A1 DIE WITH INTEGRATED MICROPHONE DEVICE USING THROUGH-SILICON VIAS (TSVs) Public/Granted day:2017-08-24
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