Invention Grant
- Patent Title: Graphene spectral purity filter
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Application No.: US15974661Application Date: 2018-05-08
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Publication No.: US10481510B2Publication Date: 2019-11-19
- Inventor: Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G02B5/20
- IPC: G02B5/20 ; G03F7/20 ; B82Y10/00 ; B82Y40/00 ; G02B5/08 ; G02B27/00 ; G03F1/24 ; G03F1/62 ; G21K1/06 ; H01B1/04 ; H01B1/24 ; G03B27/54 ; G03F1/64 ; C01B32/20

Abstract:
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
Public/Granted literature
- US20180259846A1 PELLICLE FOR RETICLE AND MULTILAYER MIRROR Public/Granted day:2018-09-13
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