Invention Grant
- Patent Title: Fabrication of vacuum electronic components with self-aligned double patterning lithography
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Application No.: US15458785Application Date: 2017-03-14
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Publication No.: US10483073B2Publication Date: 2019-11-19
- Inventor: Andrew T. Koch , Andrew R. Lingley , Max N. Mankin , Tony S. Pan
- Applicant: Elwha LLC
- Applicant Address: US WA Bellevue
- Assignee: Elwha LLC
- Current Assignee: Elwha LLC
- Current Assignee Address: US WA Bellevue
- Main IPC: H05K3/02
- IPC: H05K3/02 ; H01J9/02 ; H01J9/18

Abstract:
The present disclosure relates to methods of fabricating electronic devices or components thereof. The electronic devices can be vacuum electronic devices. The methods can include disposing a first material on or in a substrate. The methods can further include removing a portion of the first material to form one or more structure protruding from the substrate. The methods can further include disposing a second material onto the one or more structure of the first material, and then removing a portion of the second material to form one or more sidewall structures. A second portion of the one or more structures of the first material can also be removed to form a fabricated structure including the substrate and one or more sidewall structures protruding therefrom.
Public/Granted literature
- US20170263409A1 FABRICATION OF VACUUM ELECTRONIC COMPONENTS WITH SELF-ALIGNED DOUBLE PATTERNING LITHOGRAPHY Public/Granted day:2017-09-14
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