FABRICATION OF VACUUM ELECTRONIC COMPONENTS WITH SELF-ALIGNED DOUBLE PATTERNING LITHOGRAPHY

    公开(公告)号:US20170263409A1

    公开(公告)日:2017-09-14

    申请号:US15458785

    申请日:2017-03-14

    Applicant: Elwha LLC

    Abstract: The present disclosure relates to methods of fabricating electronic devices or components thereof. The electronic devices can be vacuum electronic devices. The methods can include disposing a first material on or in a substrate. The methods can further include removing a portion of the first material to form one or more structure protruding from the substrate. The methods can further include disposing a second material onto the one or more structure of the first material, and then removing a portion of the second material to form one or more sidewall structures. A second portion of the one or more structures of the first material can also be removed to form a fabricated structure including the substrate and one or more sidewall structures protruding therefrom.

    Fabrication of vacuum electronic components with self-aligned double patterning lithography

    公开(公告)号:US10483073B2

    公开(公告)日:2019-11-19

    申请号:US15458785

    申请日:2017-03-14

    Applicant: Elwha LLC

    Abstract: The present disclosure relates to methods of fabricating electronic devices or components thereof. The electronic devices can be vacuum electronic devices. The methods can include disposing a first material on or in a substrate. The methods can further include removing a portion of the first material to form one or more structure protruding from the substrate. The methods can further include disposing a second material onto the one or more structure of the first material, and then removing a portion of the second material to form one or more sidewall structures. A second portion of the one or more structures of the first material can also be removed to form a fabricated structure including the substrate and one or more sidewall structures protruding therefrom.

Patent Agency Ranking