Invention Grant
- Patent Title: Mounting table and plasma processing apparatus
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Application No.: US15270342Application Date: 2016-09-20
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Publication No.: US10515786B2Publication Date: 2019-12-24
- Inventor: Shingo Koiwa , Yasuhisa Kudo , Katsuyuki Koizumi
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2015-187827 20150925; JP2015-247630 20151218
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67 ; H01L21/683 ; F28F27/02

Abstract:
A mounting table includes a cooling table, a power feed body, an electrostatic chuck, a first elastic member and a clamping member. The power feed body is connected to the cooling table to transmit a high frequency power. A base of the electrostatic chuck has conductivity. An attraction unit has an attraction electrode and a heater therein, and is fastened to the base by metal bonding. The first elastic member is provided between the cooling table and the base to allow the electrostatic chuck to be spaced apart from the cooling table. The first elastic member forms, along with the cooling table and the base, a heat transfer space into which a heat transfer gas is supplied. The clamping member is contacted with the cooling table and the base, and allows the base and the first elastic member to be interposed between the cooling table and the clamping member.
Public/Granted literature
- US20170092472A1 MOUNTING TABLE AND PLASMA PROCESSING APPARATUS Public/Granted day:2017-03-30
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