- 专利标题: Methods and apparatus for package with interposers
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申请号: US15958949申请日: 2018-04-20
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公开(公告)号: US10522437B2公开(公告)日: 2019-12-31
- 发明人: Chun-Lin Lu , Kai-Chiang Wu , Yen-Ping Wang , Shih-Wei Liang , Ching-Feng Yang
- 申请人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 申请人地址: TW Hsin-Chu
- 专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人: Taiwan Semiconductor Manufacturing Company, Ltd.
- 当前专利权人地址: TW Hsin-Chu
- 代理机构: Slater Matsil, LLP
- 主分类号: H01L21/00
- IPC分类号: H01L21/00 ; H01L23/24 ; H05K1/18 ; H01L21/48 ; H01L21/56 ; H01L23/498 ; H01L25/10 ; H01L23/00
摘要:
An interposer may comprise a metal layer above a substrate. A dam or a plurality of dams may be formed above the metal layer. A dam surrounds an area of a size larger than a size of a die which may be connected to a contact pad above the metal layer within the area. A dam may comprise a conductive material, or a non-conductive material, or both. An underfill may be formed under the die, above the metal layer, and contained within the area surrounded by the dam, so that no underfill may overflow outside the area surrounded by the dam. Additional package may be placed above the die connected to the interposer to form a package-on-package structure.
公开/授权文献
- US20180240723A1 Methods and Apparatus for Package with Interposers 公开/授权日:2018-08-23
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