Invention Grant
- Patent Title: Optical measuring method and apparatus, and method of manufacturing semiconductor device using the same
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Application No.: US15795592Application Date: 2017-10-27
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Publication No.: US10527556B2Publication Date: 2020-01-07
- Inventor: Min-Ho Rim , Jung-Soo Kim , Young-Hoon Sohn , Yu-Sin Yang , Chung-Sam Jun , Yun-Jung Jee
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si, Gyeonggi-Do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2017-0064008 20170524
- Main IPC: G01N21/88
- IPC: G01N21/88 ; H01L21/28 ; G01N21/95 ; G06T7/00 ; H01L27/11556 ; H01L21/66 ; G02B27/09 ; H01L27/11582 ; G02B5/00
Abstract:
An optical measuring method includes generating a Bessel beam, filtering the Bessel beam to generate a focused Bessel beam, vertically irradiating the focused Bessel beam onto a substrate in which an opening is formed, and detecting light reflected from the substrate to obtain an image of a bottom surface of the opening.
Public/Granted literature
- US20180340894A1 OPTICAL MEASURING METHOD AND APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME Public/Granted day:2018-11-29
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