- 专利标题: Deposition mask, method for manufacturing the same, and touch panel
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申请号: US15359527申请日: 2016-11-22
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公开(公告)号: US10533246B2公开(公告)日: 2020-01-14
- 发明人: Michinobu Mizumura , Shuji Kudo , Koichi Kajiyama
- 申请人: V TECHNOLOGY CO., LTD.
- 申请人地址: JP Yokohama-shi
- 专利权人: V TECHNOLOGY CO., LTD.
- 当前专利权人: V TECHNOLOGY CO., LTD.
- 当前专利权人地址: JP Yokohama-shi
- 代理机构: Morgan, Lewis & Bockius LLP
- 优先权: JP2014-140709 20140708
- 主分类号: C23C14/04
- IPC分类号: C23C14/04 ; C23C14/08 ; C23C14/34 ; C25D3/12 ; C25D5/02 ; C25D5/14 ; G06F3/041
摘要:
The present invention provides a deposition mask including: a mask layer having an aperture pattern that is formed in conformity with a transparent electrode to be formed on a display surface of a display panel, with the same shape and size as the transparent electrode; and a support layer having plural support lines formed on one surface of the mask layer across the aperture pattern. In the mask, an arrangement pitch for the support lines of the support layer is set so as to reduce moire fringes or diffraction fringes that appear due to shadows of the support lines, which are transferred onto the transparent electrode as unevenness in deposition thickness.
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