Invention Grant
- Patent Title: Photoresists comprising carbamate component
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Application No.: US13907789Application Date: 2013-05-31
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Publication No.: US10539870B2Publication Date: 2020-01-21
- Inventor: William Williams, III , Cong Liu , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials, LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Peter F. Corless
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C269/04 ; C07C271/24 ; G03F7/039
Abstract:
New photoresist compositions are provided that comprise a carbamate compound that comprises 1) a carbamate group and 2) an ester group. Preferred photoresists of the invention may comprise a resin with acid-labile groups; an acid generator compound; and a carbamate compound that can function to decrease undesired photogenerated-acid diffusion out of unexposed regions of a photoresist coating layer.
Public/Granted literature
- US20140356785A1 PHOTORESISTS COMPRISING CARBAMATE COMPONENT Public/Granted day:2014-12-04
Information query
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