Invention Grant
- Patent Title: System and method for supplying and dispensing bubble-free photolithography chemical solutions
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Application No.: US15806663Application Date: 2017-11-08
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Publication No.: US10558120B2Publication Date: 2020-02-11
- Inventor: Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Eschweiler & Potashnik, LLC
- Main IPC: G03F7/16
- IPC: G03F7/16 ; B67D7/02 ; B67D7/36 ; B67D7/78

Abstract:
A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
Public/Granted literature
- US20180067395A1 SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS Public/Granted day:2018-03-08
Information query
IPC分类: