-
1.发明授权公开(公告)号：US10558120B2
公开(公告)日：2020-02-11
申请号：US15806663
申请日：2017-11-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
-
2.发明授权公开(公告)号：US09817315B2
公开(公告)日：2017-11-14
申请号：US14208529
申请日：2014-03-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , Y10T137/0318 , Y10T137/86187
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
-
公开(公告)号：US10274818B2
公开(公告)日：2019-04-30
申请号：US15618422
申请日：2017-06-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Tai Lin , Yu-Chuan Yang , Wen-Ta Liang , Ching-Huang Chen , Chi-Yuan Sun , Shih-Che Wang
Abstract: A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.
-
4.发明申请公开(公告)号：US20180174839A1
公开(公告)日：2018-06-21
申请号：US15618422
申请日：2017-06-09
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Hua-Tai Lin , Yu-Chuan Yang , Wen-Ta Liang , Ching-Huang Chen , Chi-Yuan Sun , Shih-Che Wang
IPC: H01L21/033 , G03F1/36 , G03F1/60 , G03F1/54 , G03F7/20
CPC classification number: G03F1/36 , G03F7/70125 , G03F7/70441
Abstract: A photolithography system includes a substrate stage for holding a workpiece, and a mask having main patterns and sub-resolution assistant patterns. The system further includes a diffractive optical element (DOE) for directing a radiation having an aerial image of the main patterns onto the workpiece. The DOE includes a first pair of poles that is positioned symmetrically about a center of the DOE along a first direction. The main patterns are oriented lengthwise along a second direction that is perpendicular to the first direction. The sub-resolution assistant patterns are oriented lengthwise along the first direction.
-
5.发明申请公开(公告)号：US20180067395A1
公开(公告)日：2018-03-08
申请号：US15806663
申请日：2017-11-08
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , Y10T137/0318 , Y10T137/86187
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
-
Patent Agency Ranking
6.发明申请SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS 有权供应和分配无泡沫光刻胶化学溶液的系统和方法公开(公告)号：US20150261089A1
公开(公告)日：2015-09-17
申请号：US14208529
申请日：2014-03-13
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , Y10T137/0318 , Y10T137/86187
Abstract: A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.
Abstract translation: 光刻系统包括可变容积缓冲罐，连接到缓冲罐的分配系统以及被配置为从缓冲罐的顶部空间释放气体并阻止液体从顶部空间释放的阀。 储存容器在底部具有开口，并通过该开口排入缓冲罐。 缓冲罐具有足以容纳储存容器的完整内容物的存储容量。 该系统为分配系统提供化学溶液，同时保持化学溶液不与空气和其他气体接触。
-
公开(公告)号：US11624985B2
公开(公告)日：2023-04-11
申请号：US17063386
申请日：2020-10-05
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Ta-Ching Yu , Shih-Che Wang , Shu-Hao Chang , Yi-Hao Chen , Chen-Yen Kao , Te-Chih Huang , Yuan-Fu Hsu
IPC: H01L21/66 , G03F7/20 , G01N21/956 , H01L21/027 , G01N21/89 , G06T7/00 , G01N21/88
Abstract: Embodiments of the present disclosure relate to methods for defect inspection. After pattern features are formed in a structure layer, a dummy filling material having dissimilar optical properties from the structure layer is filled in the pattern features. The dissimilar optical properties between materials in the pattern features and the structure layer increase contrast in images captured by an inspection tool, thus increasing the defect capture rate.
-
公开(公告)号：US10795270B2
公开(公告)日：2020-10-06
申请号：US15833640
申请日：2017-12-06
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Ta-Ching Yu , Shih-Che Wang , Shu-Hao Chang , Yi-Hao Chen , Chen-Yen Kao , Te-Chih Huang , Yuan-Fu Hsu
IPC: H01L21/311 , G03F7/20 , G01N21/956 , H01L21/027 , G01N21/89 , G06T7/00 , H01L21/66 , G01N21/88
Abstract: Embodiments of the present disclosure relate to methods for defect inspection. After pattern features are formed in a structure layer, a dummy filling material having dissimilar optical properties from the structure layer is filled in the pattern features. The dissimilar optical properties between materials in the pattern features and the structure layer increase contrast in images captured by an inspection tool, thus increasing the defect capture rate.
-
9.发明授权公开(公告)号：US12025917B2
公开(公告)日：2024-07-02
申请号：US16716792
申请日：2019-12-17
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Wen-Zhan Zhou , Heng-Jen Lee , Hsu-Yuan Liu , Yu-Chen Huang , Cheng-Han Wu , Shih-Che Wang , Ho-Yung David Hwang
IPC: G03F7/16 , B67D7/02 , B67D7/36 , B67D7/78 , H01L21/027
CPC classification number: G03F7/16 , B67D7/0294 , B67D7/36 , B67D7/78 , H01L21/0274 , Y10T137/0318 , Y10T137/86187
Abstract: A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
-
10.发明授权公开(公告)号：US12001132B2
公开(公告)日：2024-06-04
申请号：US16534968
申请日：2019-08-07
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Pei-Cheng Hsu , Ta-Cheng Lien , Ping-Hsun Lin , Shih-Che Wang , Hsin-Chang Lee
IPC: G03F1/22 , G03F1/48 , G03F1/52 , G03F1/54 , H01L21/027
CPC classification number: G03F1/22 , G03F1/48 , G03F1/52 , G03F1/54 , H01L21/0274
Abstract: Fabricating a photomask includes forming a protection layer over a substrate. A plurality of multilayers of reflecting films are formed over the protection layer. A capping layer is formed over the plurality of multilayers. An absorption layer is formed over capping layer. A first photoresist layer is formed over portions of absorption layer. Portions of the first photoresist layer and absorption layer are patterned, forming first openings in absorption layer. The first openings expose portions of the capping layer. Remaining portions of first photoresist layer are removed and a second photoresist layer is formed over portions of absorption layer. The second photoresist layer covers at least the first openings. Portions of the absorption layer and capping layer and plurality of multilayer of reflecting films not covered by the second photoresist layer are patterned, forming second openings. The second openings expose portions of protection layer and second photoresist layer is removed.
-
-
-
-
-
-
-
-
-
Search Results
11
records
(took 0.016 seconds)
