A semiconductor structure and a method for fabricating the same. The semiconductor structure includes a substrate and at least one semiconductor fin contacting the substrate. A first source/drain layer contacts the substrate. A silicide contacts and wraps around the first source/drain layer. The structure also includes a second source/drain layer above the first source/drain layer. The method comprises forming a structure including at least a substrate, a first source/drain layer, and at least one semiconductor fin disposed on and in contact with substrate. A silicide is formed in contact with and wrapping around the first source/drain layer. A gate structure is formed in contact with at least the at least one semiconductor fin. A second source/drain layer is formed above the first source/drain layer.