Invention Grant
- Patent Title: Mass flow controller for substrate processing
-
Application No.: US15917528Application Date: 2018-03-09
-
Publication No.: US10591934B2Publication Date: 2020-03-17
- Inventor: Sudhakar Gopalakrishnan , Peter Reimer , John Haruff , Dennis Smith
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Penilla IP, APC
- Main IPC: G05D11/13
- IPC: G05D11/13 ; G01F1/84 ; H01L21/67 ; G01N9/32

Abstract:
Methods and apparatuses for delivering a process gas to a processing chamber are provided. A mass flow controller includes a first flow line for introducing a process fluid and an inlet valve disposed along the first flow line for controlling a flow rate of the process fluid. The mass flow controller includes a second flow line for introducing a carrier fluid into the mass flow controller and a micro-electro-mechanical system (MEMS) Coriolis sensor for providing a density signal and a mass flow rate signal for a mixture of the process fluid and the carrier fluid. The mass flow controller provided includes an outlet valve for controlling a mass flow rate of the mixture that is output by the mass flow controller as well as a controller for operating the inlet valve based on the density signal and for operating the outlet valve based on the mass flow rate signal.
Public/Granted literature
- US20190279888A1 Mass Flow Controller for Substrate Processing Public/Granted day:2019-09-12
Information query