- 专利标题: Method and apparatus for measuring a size of a crystal grain, and method for fabricating a poly-silicon thin film
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申请号: US16045187申请日: 2018-07-25
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公开(公告)号: US10605596B2公开(公告)日: 2020-03-31
- 发明人: Cheng Zhou , Zhilong Yuan , Xiaodong Yang , Chunpeng Zhang , Fei Li , Yan Hu , Hongguang Yuan , Chengshih Huang , Guowei Su , Yu Zhang , Zubin Lv
- 申请人: BOE Technology Group Co., Ltd. , Chengdu BOE Optoelectronics Technology Co., Ltd.
- 申请人地址: CN Beijing CN Chengdu
- 专利权人: BOE Technology Group Co., Ltd.,Chengdu BOE Optoelectronics Technology Co., Ltd.
- 当前专利权人: BOE Technology Group Co., Ltd.,Chengdu BOE Optoelectronics Technology Co., Ltd.
- 当前专利权人地址: CN Beijing CN Chengdu
- 代理机构: Arent Fox LLP
- 代理商 Michael Fainberg
- 优先权: CN201710859678 20170921
- 主分类号: G01B21/02
- IPC分类号: G01B21/02 ; H01L21/02 ; G01Q30/02 ; G01N23/2251 ; G01B11/02 ; C30B1/02 ; G01B15/00 ; C30B29/06
摘要:
The disclosure discloses a method and apparatus for measuring a size of a crystal grain, and a method for fabricating a poly-silicon thin film. The method for measuring the size of the crystal grain includes: obtaining a grain morphology image of a crystalline region of a crystal, and drawing a grain interface diagram according to the grain morphology image; measuring at least one crystal grain in the grain interface diagram, and determining a transverse size and a longitudinal size of each measured crystal grain; and determining a transverse size and a longitudinal size of a crystal grain of the crystal according to the transverse size and the longitudinal size of each measured crystal grain.
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