Invention Grant
- Patent Title: MEMS manufacturing method and MEMS manufacturing apparatus
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Application No.: US15763240Application Date: 2016-03-18
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Publication No.: US10605824B2Publication Date: 2020-03-31
- Inventor: Shuntaro Machida , Nobuyuki Sugii , Keiji Watanabe , Daisuke Ryuzaki , Tetsufumi Kawamura , Kazuki Watanabe
- Applicant: Hitachi, Ltd.
- Applicant Address: JP Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- International Application: PCT/JP2016/058681 WO 20160318
- International Announcement: WO2017/158815 WO 20170921
- Main IPC: G01P15/08
- IPC: G01P15/08 ; B81C99/00 ; G01P15/125

Abstract:
For the purpose of shortening the MEMS manufacturing TAT, the MEMS manufacturing method according to the present invention includes a step of extracting the first MEMS with first characteristic in a range approximate to the required characteristic from the plurality of MEMS preliminarily prepared on the main surface of the substrate, and a step of forming a second MEMS having the required characteristic by directly processing the first MEMS.
Public/Granted literature
- US20180267075A1 Mems Manufacturing Method and Mems Manufacturing Apparatus Public/Granted day:2018-09-20
Information query
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