Invention Grant
- Patent Title: Method and apparatus for forming a thin layer
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Application No.: US16164953Application Date: 2018-10-19
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Publication No.: US10607832B2Publication Date: 2020-03-31
- Inventor: Junyeong Lee , Soonwook Jung , Bongjin Kuh , Pyung Moon , Sukjin Chung
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2018-0004967 20180115; KR10-2018-0043819 20180416
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/02 ; H01L21/3205 ; H01L21/3105 ; H01L21/306

Abstract:
Disclosed are method and apparatus for forming a thin layer. The method for forming the thin layer comprises providing a substrate including patterns, forming a bonding layer on the substrate covering an inner surface of a gap between the patterns, forming a preliminary layer on the bonding layer filling the gap; and thermally treating the preliminary layer to form the thin layer. The bonding layer is a self-assembled monomer layer formed using an organosilane monomer. The preliminary layer is formed from a flowable composition comprising polysilane.
Public/Granted literature
- US20190221424A1 Method and Apparatus for Forming a Thin Layer Public/Granted day:2019-07-18
Information query
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